Extraction of spatially varying dielectric function from ellipso

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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437 8, 427 8, 118712, 356369, 20419213, 20419233, 20429803, 20429832, G01J 400

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052777472

ABSTRACT:
A method of and apparatus for extracting dielectric constants from ellipsometric data taken during the growth of a semiconductor thin film and using the extracted dielectric constants to control the composition of the growing film by adjusting the growth conditions. An expression is used for the derivative of the pseudo-dielectric function with respect to the thickness of the thin film within a three-phase model, and the expression is exact to first order in thickness of the film. The expression is quadratic with respect to the dielectric function for a homogeneous thin film and additionally depends on the dielectric function of homogeneous substrate underlying the thin film. Values of the measured pseudo-dielectric function are substituted for the dielectric function of the substrate, and the expression is then solved for the dielectric function of the thin film.

REFERENCES:
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 4676644 (1987-06-01), Canteloup
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5131752 (1992-07-01), Yu et al.
D. E. Aspnes et al., "Optical control of growth of Al.sub.x Ga.sub.1-x As by organometallic molecular beam epitaxy," Applied Physics Letters, 1990, vol. 57, pp. 2707-2709.
D. E. Aspnes et al., "Growth of Al.sub.x Ga.sub.1-x As parabolic quantum wells by real-time feedback control of composition," Applied Physics Letters, 1992, vol. 60, pp. 1244-1246.
D. E. Aspnes, "Optical Properties of Solids: New Developments," Spectroscopic Ellipsometry of Solids, 1976, B. O. Seraphin (ed.), North Holland, Amsterdam, p. 829.

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