Extended kalman filter incorporating offline metrology

Details Extended kalman filter incorporating offline metrology Extended kalman filter incorporating offline metrology

2006-08-08

2006-08-08

Norton, Nadine G. (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S692000

Reexamination Certificate

active

07087527

ABSTRACT:
An algorithm uses offline metrology to control a process by passing information from an outer control loop to an inner control loop, extended Kalman filter estimator. The inner control loop operates online, and the outer control loop operates asynchronously with respect to the inner control loop. The online control loop is updated for each subsequent process. The offline metrology is optionally updated for each subsequent process.

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