Extended body contact for semiconductor over insulator transisto

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257901, 257349, H01L 2701, H01L 2910

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active

051609894

ABSTRACT:
A semiconductor over insulator transistor is provided preferably of a lightly doped drain ("LDD") profile. LDD transistor (74) includes a semiconductor mesa (76) formed over an insulating layer (94) which overlies a semiconductor substrate (96). Semiconductor mesa (76) includes a source region (78) and a drain region (80) at opposite ends thereof. A body node (82) is disposed between source and drain regions (78,80). A low resistance contact region (98) lies along substantially the entire width of body region (82) and contacts a vertical contact which permits electrical contact from the top surface of semiconductor mesa (76) to low resistance contact region (98). Low resistance contact region (98) may be extended to fully underlie source region (78) such that the vertical contact may be moved away from body node (82).

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patent: 4969023 (1990-11-01), Svedberg
Tihanyi et al., "Properties of ESFI MOS Transistors Due to the Floating Substrate and the Finite Volume," IEEE Trans. Elec. Dev., vol. ED-22, No. 11 (Nov. 1975), pp. 1017-1023.
Kumamoto et al., "An SOI Structure for Flash A/D Converter," IEEE J. Sol. St. Circ., vol. 23, No. 1 (Feb. 1988), pp. 198-201.
Lee et al., "Island Edge Effects in C-MOS/SOS Transistors," IEEE Trans. Elec. Dev., vol. ED-25, No. 8 (Aug. 1978), pp. 971-978.
Tihanyi et al., "Influence of the Floating Substrate Potential on the Characteristics of ESFI MOS Transistors," Solid-State Electronics, vol. 18, (Pergamon Press, 1975), pp. 309-314.

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