Exposure system, exposure method and method for...

Details Exposure system, exposure method and method for... Exposure system, exposure method and method for...

2005-12-12

2008-10-14

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000

Reexamination Certificate

active

07436491

ABSTRACT:
An exposure system includes: an illumination optical system defining, in an effective illumination source plane, a center region forming a perpendicularly incident light and first and second eccentric regions forming obliquely incident lights having a perpendicular electric vector component perpendicular to a straight line connecting the first and second eccentric regions, the electric vector component being larger than a parallel electric vector component parallel to the straight line, and illuminating the mask pattern with the perpendicularly incident light and the obliquely incident lights; and a projection optical system projecting an image of the mask pattern to a processing object.

REFERENCES:
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patent: 5815247 (1998-09-01), Poschenrieder et al.
patent: 6045976 (2000-04-01), Haruki et al.
patent: 6842223 (2005-01-01), Tyminski
patent: 2004/0057036 (2004-03-01), Kawashima et al.
patent: 2004/0201831 (2004-10-01), Tyminski
patent: 2005/0007473 (2005-01-01), Theil et al.
patent: 2005/0007573 (2005-01-01), Hansen et al.
patent: 06-053120 (1994-02-01), None
patent: 3246615 (2001-11-01), None
patent: WO 2005/027207 (2005-03-01), None
English Translation of JP 06-053120 (dated (Feb. 25, 1994).
English Translation of JP 3246615 (dated (Nov. 2, 2001).
Search Report issued by the Netherlands Patent Office on Oct. 15, 2007, for Netherlands Patent Application No. 135724.

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