Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1996-02-21
1997-09-09
Hantis, K.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
355 68, G01B 1100
Patent
active
056662068
ABSTRACT:
An exposure system and method that enable to realize uniform pattern transfer with high accuracy independent of time-dependent illumination deterioration of an exposing light source and/or replacement thereof. An illumination detector detects an illumination of a ray of the exposing light penetrating through one of lens elements of a fly-eye lens. An aligner aligns a position of the detector with a corresponding one of the lens elements of a fly-eye lens. The repetition of the illumination detection for all the lens elements enables to know and compare the illumination distribution for the entire beam of the light with a wanted one in advance. An exposure process is performed after suitable correction of the known distribution and therefore, pattern transfer can be realized uniformly with high accuracy even for fine patterns on a reticle.
REFERENCES:
patent: 4988188 (1991-01-01), Ohta
patent: 5420417 (1995-05-01), Shiraishi
K. Yamanaka et al.; "NA and .sigma. Optimization for High NA I-line Lithography"; SPIE vol. 1927, Optical Laser Microlithography VI (1993); pp. 310-319.
Hantis K.
NEC Corporation
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