X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1992-12-14
1994-01-04
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378205, G21K 500
Patent
active
052767256
ABSTRACT:
An exposure apparatus usable with a mask having a pattern and a wafer having a radiation-sensitive surface layer, for transferring with a radiation energy beam the pattern of the mask to the wafer, is disclosed. The apparatus includes a mask supporting member for supporting the mask; a wafer supporting member for supporting the wafer; a reflective member having a reflection surface and an indication pattern, the reflective member being supported by one of the mask supporting member and the wafer supporting member; an arrangement for projecting a beam, which is thinner than the radiation energy beam and which advances along or about the axis of the radiation energy beam, upon the reflective member; a device for observing a positional relationship between the indication pattern and a spot formed by projection of the thinner beam upon the reflective member; and a device for correcting a relationship between the indication pattern and the spot, on the basis of the observation.
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Betz, H., et al., "Resolution limits in x-ray lithography calculated by means of x-ray lithography simulator XMAS", Journal of Vacuum Science and Technology, Jan.-Feb. 1986, vol. 4, No. 1, pp. 248-252.
Kawakami Eigo
Uzawa Shunichi
Yoshii Minoru
Canon Kabushiki Kaisha
Church Craig E.
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