Exposure recording method for optical recording materials

Details Exposure recording method for optical recording materials Exposure recording method for optical recording materials

1998-07-10

2000-04-11

Angebranndt, Martin

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430320, 430945, 369 84, G11B 726

Patent

active

060486694

ABSTRACT:
In an exposure device 20 for an optical disc master disc, the power density of light beam which is converged until the diffraction limit level by using a light source laser 1 of far ultraviolet radiation and an objective lens 7 having a numerical aperture of 0.85 or more is set to 4.upsilon..times.10.sup.2 W/cm.sup.2 or more (.upsilon.)[cm/sec] represents a linear velocity of recording), and a photoresist 8 on the master disc 9 of the optical disc is subjected to light exposure and heat treatment at the same time.

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