Exposure of photo resist

Details Exposure of photo resist Exposure of photo resist

1983-12-21

1985-09-03

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156901, 430 5, 430313, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

045390703

ABSTRACT:
A method and apparatus for limiting the interference caused by shadows of minute particles of opaque matter that settles on the surface of an assembly of a metal substrate, a resist and an overlay by placing a second glass overlay on top of the assembly to raise the surface to a level where the shadows of any particles resting there will be diffused.

REFERENCES:
patent: 4413051 (1983-11-01), Thomas
patent: 4465759 (1984-08-01), Duly et al.
patent: 4499162 (1985-02-01), Banks et al.

Affiliated with

Also associated with

Rating

Exposure of photo resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure of photo resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure of photo resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-612118