Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive...
Patent
1993-01-26
1998-12-22
Nuzzolillo, M.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
430326, G03C 500
Patent
active
058517251
ABSTRACT:
A lithography process which utilizes metastable atoms for resist exposure is disclosed. Metastable rare gas atoms, instead of photons, electrons or ions, are directed at the surface of a lithographic resist. On impact, the metastable atoms release up to 20 eV of energy per atom in the form of secondary electrons. These secondary electrons alter chemical bonds in the resist, causing it to become either soluble or insoluble in an appropriate developer solution. The metastable rare gas atoms can further be manipulated with the new techniques of atom optics to focus them, improve their collimation and intensity, or modulate them.
REFERENCES:
patent: 4238706 (1980-12-01), Yoshihara et al.
patent: 4515876 (1985-05-01), Yoshihara et al.
patent: 4574198 (1986-03-01), Lucas et al.
patent: 4615756 (1986-10-01), Tsujii et al.
patent: 4703166 (1987-10-01), Bruning
patent: 4720469 (1988-01-01), Keser et al.
patent: 4746799 (1988-05-01), McMillan
patent: 4773750 (1988-09-01), Bruning
patent: 4785192 (1988-11-01), Bruning
patent: 4883352 (1989-11-01), Bruning
patent: 4972244 (1990-11-01), Buffet et al.
patent: 4974227 (1990-11-01), Saita et al.
patent: 5002632 (1991-03-01), Loewenstein et al.
patent: 5038082 (1991-08-01), Arita et al.
patent: 5074955 (1991-12-01), Henry et al.
patent: 5078833 (1992-01-01), Kadomura
Brand, J.A. et al, "Production of a high-density state-selected metastable eon beam"; American Institute of Physics, Jan. 1992 pp. 163-165.
Balykin, V.I. et al., "Laser Optics of Neutral Atomic Beams", Physical Today, Apr. 1989, pp. 23-28.
"Optics' New Focus: Beams of Atoms", Research News, Mar. 1992, pp. 1513-1515.
Carnal, O. et al. "Imaging and Focusing of Atoms by a Fresnel Zone Plate", The American Physical Society, 2 Dec. 1991, vol. 67, No. 23, pp. 3231-3234.
Nacher, P.J. et al.; "Optical pumping in .sup.3 He with a laser", Journal de Physique, No. 12, pp. 2057-2073.
Bubert, W., "Preparation of Polarized Excited Rare Gas Atom States R(np.sup.5 (n+1)s) and R(np.sup.5 (n+1)p) by Laser Optical Pumping", Atoms, Molecules and Clusters 1, pp. 321-330 (1986).
Lynn, J.G. et al., "Optical pumping of rare-gas metastable atom beams with a frequency-modulated multimode dye laser", Applied Optics, vol. 25, No. 13, 1 Jul. 1986, pp. 2154-2157.
Balykin, V.I., "Focusing of an atomic beam and imaging of atomic sources by means of a laser lens based on resonance-radiation pressure", Journal of Modern Optics, 1988, vol. 35, No. 1, pp. 17-34.
Prodan, John V. et al., "Laser Production of a Very Slow Monoenergetic Atomic Beam", Physical Review Letters, vol. 49, No. 16, 18 Oct. 1982, pp. 1149-1153.
Sheehy, B. et al, "Magnetic-Field-Induced Laser Cooling below the Doppler Limit", Physical Review Letters, vol. 64, No. 8, 19 Feb. 1990, pp. 858-861.
Riis, Erling et al., "Atom Funnel for the Production of a Slow, High-Density Atomic Beam", Physical Review Letters, vol. 64, No. 14, 2 Apr. 1990, pp. 1658-1661.
McClelland, J.J. et al., "Laser focusing of atoms: a particle-optics approach", Journal of the Optical Society of America B, vol. 8, No. 9 Sep. 1991, pp. 1974-1986.
Nuzzolillo M.
The United States of America as represented by the Secretary of
Werner L. S.
LandOfFree
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