Exposure method with electron beam exposure apparatus

Details Exposure method with electron beam exposure apparatus Exposure method with electron beam exposure apparatus

1982-06-09

1984-12-18

Smith, Alfred E.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 37317

Patent

active

044892411

ABSTRACT:
An exposure method with an electron beam exposure apparatus in which an electron beam is emitted onto a substrate such as a silicon wafer on which an electron-beam sensitive resist is coated, thereby directly forming or writing patterns. A substrate having thereon a number of chips are divided into blocks, which each contain a plurality of chips. Marks are provided on each of the blocks, the positions of the marks are detected and the writing exposure positions of the chips within each block are modified on the basis of the detection results. According to this invention, efficient writing exposure can be made with high accuracy.

REFERENCES:
patent: 4322626 (1982-03-01), Kawashima

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