Exposure method utilizing optical proximity corrected...

Details Exposure method utilizing optical proximity corrected... Exposure method utilizing optical proximity corrected...

2005-11-22

2005-11-22

Thompson, A. M. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C430S005000

Reexamination Certificate

active

06968531

ABSTRACT:
In the exposure method which carries out optical proximity correction processing for exposure data having a plurality of exposure patterns and exposes a sample in accordance with such corrected exposure data, the exposure patterns to be corrected are converted, in the optical proximity correction processing, into a minus objective pattern and a minus pattern to be deleted from the minus objective pattern, to form corrected exposure data. And, the minus pattern is deleted from the minus objective pattern of the corrected exposure data to bitmap a corrected exposure pattern, to expose a sample in accordance with such bitmapped corrected exposure pattern.

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