Exposure method, exposure tool and method of manufacturing a...

Details Exposure method, exposure tool and method of manufacturing a... Exposure method, exposure tool and method of manufacturing a...

2005-10-14

2008-11-04

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07446853

ABSTRACT:
An exposure method is disclosed, which includes forming on a substrate a resist film having first and second exposure fields arranged in a column direction, mounting the substrate on a scanning exposure tool in order to project a design pattern on the first and second exposure fields, forming a liquid immersion medium fluid film by using a liquid immersion medium fluid film forming unit, and projecting the design pattern onto the first or second exposure fields by varying an optical pattern image generated at the optical pattern image generating unit while moving the substrate in a direction in parallel with the column direction, wherein the projection of the design pattern onto the first and second exposure fields is continuously carried out without a change in a moving direction of the substrate and a direction of the flow of the liquid immersion medium fluid film.

REFERENCES:
patent: 6342942 (2002-01-01), Uzawa
patent: 6952253 (2005-10-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2003-100626 (2003-04-01), None
patent: 2005-072132 (2005-03-01), None
patent: WO 99/49504 (1999-09-01), None

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