Exposure method, exposure device and device producing method

Details Exposure method, exposure device and device producing method Exposure method, exposure device and device producing method

1997-01-21

2000-11-07

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, H01L 2130

Patent

active

061447196

ABSTRACT:
An exposure method including the steps of providing a wafer and a mask having a membrane and a pattern formed thereon, arranging the mask and the wafer opposite to each other, obtaining information corresponding to deformation of the membrane of the mask, reducing the influence of the deformation of the membrane, and transferring the pattern of the mask to the wafer by exposing the mask to radiant energy. Also disclosed is an exposure device for performing this exposure method.

REFERENCES:
patent: 4385434 (1983-05-01), Zehnpfennig et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 5333167 (1994-07-01), Iizuka et al.
patent: 5604779 (1997-02-01), Amemiya et al.

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