Exposure method and system for photolithography

Details Exposure method and system for photolithography Exposure method and system for photolithography

1987-05-12

1988-03-29

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, G03B 2732, G03B 2742

Patent

active

047347465

ABSTRACT:
An exposure method for photolithography comprises the steps of forming a pattern on a substrate by the use of a first exposure apparatus including a first imaging optical system having a reduction magnification 1/.beta.1 and an image circle of a diameter .phi.1, and forming a second pattern on the substrate on which the first pattern has been formed, by the use of a second exposure apparatus including a second imaging optical system having a reduction magnification 1/.beta.2 different from the reduction magnification 1/.beta.1 and an image circle of a diameter .phi.2, wherein when N is an integer, the conditions that .beta.1.times..phi.1=.beta.2.times..phi.2 and .phi.1=N.times..phi.2 are satisfied.

REFERENCES:
patent: 3716296 (1973-02-01), Springer et al.
patent: 4155642 (1979-05-01), Lacombat
patent: 4397543 (1983-08-01), Kolbe et al.
patent: 4505580 (1985-03-01), Michel
patent: 4506977 (1985-03-01), Sato et al.

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