Exposure method and apparatus for immersion lithography

Details Exposure method and apparatus for immersion lithography Exposure method and apparatus for immersion lithography

2008-09-02

2008-09-02

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492210, C355S030000, C355S053000, C355S067000

Reexamination Certificate

active

11251330

ABSTRACT:
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.

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Switkes, M., et al., “Immersion Lithography at 157 nm”, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, Issue 6, Nov. 2001, pp. 2353-2356.

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