Exposure method and apparatus, coating apparatus for...

Details Exposure method and apparatus, coating apparatus for... Exposure method and apparatus, coating apparatus for...

2006-12-06

2010-11-09

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C700S121000, C355S027000

Reexamination Certificate

active

07829263

ABSTRACT:
Disclosed are an exposure method and apparatus, a coating apparatus and a device manufacturing method, wherein, in one preferred form, the exposure method is used to expose a resist having been applied onto a substrate by one of a plurality of resist coating units, and it includes a selecting step for choosing an exposure amount pattern that represents exposure amounts corresponding to a plurality of shots on the substrate, respectively, on the basis of a resist coating unit data that specifies which unit among the plurality of resist coating units should be used to apply a resist onto the substrate, and an exposure step for exposing the resist on the substrate in accordance with the exposure amount pattern chosen by the selecting step.

REFERENCES:
patent: 6641981 (2003-11-01), Kaneko et al.
patent: 6889014 (2005-05-01), Takano
patent: 6897076 (2005-05-01), Sugiura
patent: 2001-144009 (2001-05-01), None
patent: 2004-119570 (2004-04-01), None
patent: 2006-128572 (2006-05-01), None

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