Exposure method and apparatus, and device manufacturing method

Details Exposure method and apparatus, and device manufacturing method Exposure method and apparatus, and device manufacturing method

2005-03-22

2005-03-22

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S052000, C356S399000

Reexamination Certificate

active

06870599

ABSTRACT:
A scanning exposure apparatus is provided that is capable of increasing the overlay accuracy. Every time a reticle is exchanged, a direction overlay correction table is updated. A control device for the exposure apparatus corrects the target positions (target locus) of a wafer stage on the basis of the direction overlay correction table.

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