Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1996-09-05
1999-05-11
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430394, 430396, G03F7/20
Patent
active
059027169
ABSTRACT:
After a photoresist is applied onto a wafer, a contrast enhancement material (CEM) layer is applied onto this photoresist. A pattern is projected through this CEM layer onto the photoresist. Next, this CEM layer is removed from the photoresist and thereafter a new CEM layer is again applied onto the photoresist. Another pattern is projected through this new CEM layer onto the photoresist, whereby the photoresist is exposed in accordance with a composite pattern of the two patterns. This composite pattern can surpass the resolution limit of projection optical system.
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Okamoto Kazuya
Ooki Hiroshi
Owa Soichi
Shibuya Masato
Duda Kathleen
Nikon Corporation
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