Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1993-12-03
1995-08-22
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430397, 355 53, 355 77, 356399, G03F 900
Patent
active
054439329
ABSTRACT:
An exposure method includes disposing a mask and a semiconductor wafer opposed to each other in a close proximity relation with respect to a Z-axis direction and printing a pattern of the mask on each of different shot areas of the semiconductor wafer in a step-and-repeat manner, with a predetermined exposure energy. In this method, the spacing between the mask and the wafer for the paralleling of them is made larger than the spacing therebetween as assumed at the time of mask-to-wafer alignment with respect to X-Y plane or the spacing between the mask and the wafer as assumed at the time of exposure of the wafer to the mask. After the paralleling of the mask and the wafer, the mask and the wafer are moved closer to each other in the Z-axis direction and alignment and exposure is performed. This ensures that the alignment and exposure are effected at an optimum spacing while, on the other hand, contact of the mask and the wafer at the time of paralleling is precluded.
REFERENCES:
patent: 4623608 (1986-11-01), Andrevski
patent: 4669868 (1987-06-01), Chapelle et al.
patent: 4676630 (1987-06-01), Matsushita et al.
patent: 4748477 (1988-05-01), Isohata et al.
patent: 4864360 (1989-09-01), Isohata et al.
patent: 4870668 (1989-09-01), Frankel et al.
patent: 4891526 (1990-01-01), Reeds
patent: 4998134 (1991-03-01), Isohata et al.
Kawakami Eigo
Ohta Hirohisa
Ozawa Kunitaka
Uzawa Shunichi
Canon Kabushiki Kaisha
Duda Kathleen
McCamish Marion E.
LandOfFree
Exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2140982