Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1995-04-04
1996-03-12
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 5, 430311, 430312, 355 53, 2504911, 437 8, G03F 900
Patent
active
054985013
ABSTRACT:
A method of manufacturing of semiconductor devices, includes exposing different portions of a semiconductor substrate with a first exposure apparatus having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus, which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the entire second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.
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Deguchi, et al., "Step-and-Repeat X-Ray/Photo Hybrid Lithography for 0.3-.mu.m MOS Devices," IEEE Transactions on Electron Devices, vol. ED/34, No. 4, Apr. 1987, pp. 759 through 764.
Kariya Takao
Mizusawa Nobutoshi
Ozawa Kunitaka
Shimoda Isamu
Uzawa Shunichi
Canon Kabushiki Kaisha
Chapman Mark
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