Exposure method

Details Exposure method Exposure method

1994-01-05

1995-08-08

Allen, Stephone B.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

054401380

ABSTRACT:
A plurality of reticles have each two alignment mark images and an identical or a different pattern image. First, the two alignment mark images and the pattern image of the first reticle are exposed on a first shot area on a wafer. Next, when exposing the two alignment mark images and the pattern image of the second reticle on a second shot area adjacent to the first shot area, the exposed two alignment mark images on the first shot area are detected to adjust the wafer and the second reticle based on the result of the detection such that the exposed pattern images on the first and second shot areas are joined correctly. Thus, the pattern images of the left reticles are also exposed successively with the exposed adjacent pattern images joined. Preferably, after each detection, the detected two alignment mark images are deleted by the double exposure.

REFERENCES:
patent: 4444492 (1984-04-01), Lee
patent: 4669866 (1987-06-01), Phillips
patent: 4982227 (1991-01-01), Suzuki
patent: 5004348 (1991-04-01), Magome
patent: 5140366 (1992-08-01), Shiozawa et al.
patent: 5148214 (1992-09-01), Ohta et al.
patent: 5204535 (1993-04-01), Mizutani
patent: 5249016 (1993-09-01), Tanaka
patent: 5262822 (1993-11-01), Kosugi et al.

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