Exposure method

Details Exposure method Exposure method

2006-10-24

2009-06-16

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C430S022000, C430S322000

Reexamination Certificate

active

07547502

ABSTRACT:
An exposure method includes the step of illuminating a mask having a contact hole pattern that includes a hybrid pattern using an illumination light that forms an effective source that has plural poles, and projecting an image of the mask onto a plate through a projection optics. The hybrid pattern includes a matrix pattern in which plural contact holes are arranged in a matrix shape, and a checker pattern in which plural contact holes are arranged in a checker shape. Three or four diffracted lights from the contact hole pattern interfere with each other.

REFERENCES:
patent: 2002/0031725 (2002-03-01), Sugita et al.
patent: 2003/0198872 (2003-10-01), Yamazoe et al.
patent: 2004/0166422 (2004-08-01), Yamazoe et al.
patent: 2000-40656 (2000-02-01), None
patent: 2003-203850 (2003-07-01), None
patent: 2003-233165 (2003-08-01), None
patent: 2003-318100 (2003-11-01), None
patent: 2004-272228 (2004-09-01), None
Hochul Kim et al., “Layer Specific Illumination Optimization by Monte Carlo Method”, Optical Microlithography XVI, Anthony Yen, Editor, Proceedings of SPIE, 2003, pp. 244-250, vol. 5040.

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