Exposure method

Details Exposure method Exposure method

2011-08-16

2011-08-16

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000

Reexamination Certificate

active

07998660

ABSTRACT:
An exposure method is disclosed. A wafer coated with a photoresist layer having an exposure threshold dose is provided. The wafer has at least a central region and a peripheral region. Then, a compensating light beam having a first dose directs on the photoresist layer within the peripheral region. Next, a patterned light beam having a second dose is then projected, in a step-and-scan manner, onto the photoresist layer, thereby exposing the photoresist layer. The total dose of the first energy and the second energy is above than the exposure threshold dose.

REFERENCES:
patent: 5204224 (1993-04-01), Suzuki
patent: 5885756 (1999-03-01), Yun et al.
patent: 6873938 (2005-03-01), Paxton et al.
patent: 2006/0078828 (2006-04-01), Atkinson et al.

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