Exposure head, exposure apparatus, and application thereof

Details Exposure head, exposure apparatus, and application thereof Exposure head, exposure apparatus, and application thereof

2006-07-18

2006-07-18

Tran, Huan (Department: 2861)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

Reexamination Certificate

active

07077972

ABSTRACT:
A method of creating a micro-channel in a substrate surface by exposing a resist film with a laser beam, removing the exposed resist film per the predetermined pattern, and etching the substrate using the predetermined pattern to form the micro-channel.

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