Exposure head

Details Exposure head Exposure head

2006-06-13

2006-06-13

Pham, Hai (Department: 2861)

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Light or beam marking apparatus or processes

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C347S255000, C385S004000

Reexamination Certificate

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07061517

ABSTRACT:
In the present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula.DW≤α×M2×t-K×λaθIn the above formula, parameters are defined as follows.λ: the wavelength of laser lightθ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formulain-line-formulae description="In-line Formulae" end="lead"?θ=sin−1(NA)in-line-formulae description="In-line Formulae" end="tail"?D: the width of beam outputted from the illumination light sourceW: the beam width at the position where the DMD is placed (at the irradiated surface)a: the size of one pixel on the DMDK: a coefficient determined by beam characteristics, K=1M: the magnification of imaging optical systemt: required focal depthα: acceptable increased amount of beam diameter

REFERENCES:
patent: 6034378 (2000-03-01), Shiraishi
patent: 6121983 (2000-09-01), Fork et al.
patent: 6480218 (2002-11-01), Kurematsu
patent: 6535271 (2003-03-01), Ogasawara
patent: 6542178 (2003-04-01), Miyagawa et al.
patent: 6717106 (2004-04-01), Nagano et al.
patent: 6768505 (2004-07-01), Zelenka
patent: 6832045 (2004-12-01), Nakaya et al.

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