Exposure equipment with optical system positioning mechanism...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S072000, C355S075000, C355S077000

Reexamination Certificate

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07315349

ABSTRACT:
Exposure equipment useful in the manufacture of semiconductor devices and a related method of operation are disclosed. The exposure equipment directs light through a reticle and an optical system positioned above a wafer onto a target portion of the wafer, and the wafer is rapidly transferred under the directed light to irradiate substantially the entire surface of the wafer. Recursive compensation for undesired movement of the reticle and optical system caused by the rapid transfer of the wafer is provided.

REFERENCES:
patent: 6144118 (2000-11-01), Cahill et al.
patent: 6816232 (2004-11-01), Takahashi et al.
patent: 6879375 (2005-04-01), Kayama
patent: 6897939 (2005-05-01), Hara
patent: 2003/0053035 (2003-03-01), Butler et al.
patent: 2005/0140955 (2005-06-01), Butler et al.
patent: 10261580 (1998-09-01), None
patent: 11325821 (1999-11-01), None
patent: 2001-015409 (2001-01-01), None
patent: 1994-0016440 (1994-07-01), None
patent: 1998080359 (1998-11-01), None
patent: 1020040024898 (2004-03-01), None
English translation of JP 2001-15409 (dated Jan. 19, 2001) cited by Applicant in his IDS.

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