Exposure device and method of fabricating liquid crystal...

Details Exposure device and method of fabricating liquid crystal... Exposure device and method of fabricating liquid crystal...

2005-07-26

2005-07-26

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S321000, C430S396000, C355S053000, C355S076000

Reexamination Certificate

active

06921628

ABSTRACT:
An exposure device includes a light irradiator for irradiating light, a mask having a pattern to be formed on a substrate, the mask having a size larger than at least two display panel areas positioned on the substrate, and at least two vacuum pads positioned along sides of the mask for affixing the mask over the substrate.

REFERENCES:
patent: 2001/0009455 (2001-07-01), Nishimura et al.

Affiliated with

Also associated with

Rating

Exposure device and method of fabricating liquid crystal... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure device and method of fabricating liquid crystal..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure device and method of fabricating liquid crystal... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3406277