Exposure data preparation method and exposure method

Details Exposure data preparation method and exposure method Exposure data preparation method and exposure method

2011-07-12

2011-07-12

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S296000, C430S942000

Reexamination Certificate

active

07977018

ABSTRACT:
In the exposure data preparation method for charged particle beam exposure in which an exposure object is exposed while dose is adjusted for each pattern, the method including the steps of: classifying a pattern in terms of a target linewidth; setting a standard characteristic showing the relationship between a standard dose and a resultant linewidth of a resist pattern for a group of patterns having the target linewidth; and preparing exposure data by correcting a shape and dose so that a characteristic showing the relationship between dose of each pattern having the target linewidth and a resultant linewidth of a resist pattern follows the standard characteristic.

REFERENCES:
patent: 6509127 (2003-01-01), Yamashita
patent: 11-26360 (1999-01-01), None
patent: 2001-52999 (2001-02-01), None
patent: 2005-101501 (2005-04-01), None

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