Exposure data generator and method thereof

Details Exposure data generator and method thereof Exposure data generator and method thereof

2009-01-16

2010-12-28

Doan, Nghia M (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000, C430S030000

Reexamination Certificate

active

07861210

ABSTRACT:
An exposure data generator for generating exposure data representing graphical information of a pattern to be exposed and a computer-readable recording medium are provided. The generator includes a storage device for storing pre-correction exposure data which include information on positions and sizes of patterns placed within an target region and a search device for classifying the patterns according to placement positions within the target region, searching for a pattern which is another pattern by using the classified patterns, and storing information on the patterns. The generator also includes a back-scattering intensity calculation device for calculating a back-scattering intensity from at an evaluation point on the pattern. The generator also includes a movement quantity calculation device for calculating a movement quantity of a side of a pattern.

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Japanese Office Action mailed Apr. 27, 2010 in corresponding Japanese Application No. 2005-051771 (2 pages) (partial English translation 1 page).

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