Exposure apparatus, maintenance method therefor,...

Details Exposure apparatus, maintenance method therefor,... Exposure apparatus, maintenance method therefor,...

2006-04-11

2006-04-11

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000, C355S057000, C355S077000, C382S145000

Reexamination Certificate

active

07027128

ABSTRACT:
A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively moving the reticle and the substrate, a control system which controls an operation of the exposure system, the control system determining whether a condition of an exposure performed by the exposure system is within a tolerance during the exposure, and causing the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the control system determines that the condition is out of the tolerance for the unit region, and a user interface system which indicates information for identifying the unit region, for which the control system determines that the condition is out of the tolerance, of the substrate.

REFERENCES:
patent: 4849901 (1989-07-01), Shimizu
patent: 4996640 (1991-02-01), Yamada et al.
patent: 5112133 (1992-05-01), Kurosawa et al.
patent: 5113229 (1992-05-01), Higashio et al.
patent: 5115320 (1992-05-01), Ebihara et al.
patent: 5182615 (1993-01-01), Kurosawa et al.
patent: 5883701 (1999-03-01), Hasegawa et al.
patent: 5999707 (1999-12-01), Taniguchi et al.
patent: 6028659 (2000-02-01), Kaneko
patent: 6198982 (2001-03-01), Park et al.
patent: 6215896 (2001-04-01), Greig et al.
patent: 6385497 (2002-05-01), Ogushi et al.
patent: 6657703 (2003-12-01), Kurosawa

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