Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2007-10-23
2007-10-23
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Reexamination Certificate
active
10650013
ABSTRACT:
An inspection method for an exposure apparatus for illuminating a photomask on a first installation member by an illumination optical system, and for projecting an image of a pattern of the photomask onto a substrate on a second installation member through a projection optical system, the inspection method comprises disposing an inspection photosensitive substrate as the substrate on the second installation member, illuminating a first region which doesn't include a pupil end of the projection optical system and a second region which includes the pupil end of the projection optical system and which isn't overlapped with the first region, in a state in which a surface of the photosensitive substrate and a surface of a secondary light source of the illumination optical system are optically conjugate with each other, and inspecting an illumination axis offset of the exposure apparatus based on a pattern obtained by developing the photosensitive substrate.
REFERENCES:
patent: 4848903 (1989-07-01), Fendt
patent: 5392094 (1995-02-01), Kudo
patent: 5610684 (1997-03-01), Shiraishi
patent: 5973771 (1999-10-01), Hibbs et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6048651 (2000-04-01), Brunner et al.
patent: 6163376 (2000-12-01), Nomura et al.
patent: 6262793 (2001-07-01), Sasaya et al.
patent: 6317198 (2001-11-01), Sato et al.
patent: 6356345 (2002-03-01), McArthur et al.
patent: 6822740 (2004-11-01), Nomura
patent: 1136708 (1996-11-01), None
patent: 90107655 (2002-05-01), None
patent: 61-210627 (1986-09-01), None
patent: 03-065623 (1991-03-01), None
patent: 2000-021732 (2000-01-01), None
patent: 2001-330964 (2001-11-01), None
patent: 2002-083761 (2002-03-01), None
Notification of the First Office Action from the State Intellectual Property Office of the People's Republic of China dated Apr. 8, 2005, in patent application No. 031560024, and English translation.
Kazuya Sato et al., “Measurement of effective source shift using a grating-pinhole mask,” SPIE, vol. 3679, pp. 99-107 (Mar. 1999).
Notification of Reasons for Rejection, mailed Jan. 30, 2007, in Japanese counterpart Application No. 2002-255210.
Kirk et al., “Pupil Illumination; in situ measurement of partial coherence,” SPIE, 3334:281-288.
Search Report mailed on Jun. 1, 2007, by the Dutch Patent Office in Dutch patent application No. 1024195.
Fukuhara Kazuya
Inoue Soichi
Akanbi Isiaka O
Chowdhury Tarifur
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
LandOfFree
Exposure apparatus inspection method and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Exposure apparatus inspection method and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus inspection method and exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3897234