Exposure apparatus including micro mirror array and exposure...

Details Exposure apparatus including micro mirror array and exposure... Exposure apparatus including micro mirror array and exposure...

2006-06-13

2006-06-13

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S075000

Reexamination Certificate

active

07061582

ABSTRACT:
An exposure method and apparatus for use in exposing a photoresist on a semiconductor wafer do not employ an aperture for shaping the exposure light. The exposure apparatus includes a light source unit, a reflecting mirror unit having a micro mirror array (MMA) and a control unit that controls the MMA, and a pattern transfer unit that transfers the pattern of a photomask onto the photoresist. The angles of inclination of the respective mirrors of the MMA are adjusted to reflect incident light in a manner that shapes the incident light. Accordingly, it is possible to form a pattern having the highest degree of resolution and optimum depth of focus (DOF) in the shortest amount of processing time.

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patent: 6791666 (2004-09-01), Yu et al.
patent: 2002/0159040 (2002-10-01), Hamatani et al.
patent: 9318889 (1997-12-01), None
patent: 10209019 (1998-08-01), None
Raka Bandyo, “MEMS Technology Development”, NASA Undergraduate Student Research Program, Fall 2001, pp. 1-11.

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