Exposure apparatus for reproducing a mask pattern onto a photo-s

Details Exposure apparatus for reproducing a mask pattern onto a photo-s Exposure apparatus for reproducing a mask pattern onto a photo-s

1995-05-16

1998-06-30

Dzierzynski, Paul M.

Optical: systems and elements

Holographic system or element

Copying by holographic means

359 3, 359 32, 359 35, G03H 120

Patent

active

057742405

ABSTRACT:
An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate uses holographic techniques. The apparatus includes support for holding a hologram recording plate at a predetermined position during both a recording operation and a reconstructing operation. A first illuminating optical system introduces a light beam from a coherent light source to a mask and irradiates a subject beam produced from the mask into the recording plate. A second illuminating optical system irradiates the light beam from a coherent light source as a reference beam into the recording plate, a carrier apparatus disposes during the reconstructing operation, a substrate at the position of the mask, in place of the mask. A third illuminating optical system for irradiates a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by the recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate. A controler for for selectively controlling the first, second and third illuminating optical systems puts an at least a selected one of the optical system into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.

REFERENCES:
patent: H841 (1990-11-01), Lanteigne
patent: 4857425 (1989-08-01), Phillips
patent: 4943126 (1990-07-01), Lang et al.
patent: 4959284 (1990-09-01), Smothers et al.
patent: 4966428 (1990-10-01), Phillips
patent: 5322747 (1994-06-01), Hugle

Affiliated with

Also associated with

Rating

Exposure apparatus for reproducing a mask pattern onto a photo-s does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus for reproducing a mask pattern onto a photo-s, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus for reproducing a mask pattern onto a photo-s will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1865645