Exposure apparatus for drawing patterns on substrates

Details Exposure apparatus for drawing patterns on substrates Exposure apparatus for drawing patterns on substrates

1993-07-23

1994-08-30

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 46, 355 70, G03B 2742

Patent

active

053432711

ABSTRACT:
The invention is an exposure apparatus for directly drawing a pattern on a photoresist layer on a substrate. The apparatus has a movable stage on which the substrate is placed, an array of a plurality of semiconductor lasers held above the movable stage, laminated arrays of optical elements to project a suitably shaped laser beam spot on the substrate from each semiconductor laser and control means for exciting and deexciting the semiconductor lasers each individually while moving the stage such that the substrate passes under the array of semiconductor lasers. The primary merit of this apparatus is a great reduction in the time taken to accomplish exposure of a very large-sized substrate such as, e.g., a substrate of a flat-panel display for a high-definition television set.

REFERENCES:
patent: 4541712 (1985-09-01), Whitney
patent: 5091744 (1992-02-01), Omata

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