Exposure apparatus, exposure method, and device...

Details Exposure apparatus, exposure method, and device... Exposure apparatus, exposure method, and device...

2006-06-07

2010-11-16

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C356S401000

Reexamination Certificate

active

07834978

ABSTRACT:
An exposure apparatus for exposing a substrate to light. A substrate stage holds and moves the substrate, a scope measures a predetermined mark to align the substrate, and a controller controls the position of the substrate stage and the operation of the scope, thereby executing a first measurement and a second measurement necessary for a single calibration of the apparatus to align the substrate. The controller executes the first measurement and the second measurement at frequencies different from each other.

REFERENCES:
patent: 4962318 (1990-10-01), Nishi
patent: 5243195 (1993-09-01), Nishi
patent: 5801815 (1998-09-01), Takahashi
patent: 6198527 (2001-03-01), Nishi
patent: 6539326 (2003-03-01), Hirano
patent: 2002/0006561 (2002-01-01), Taniguchi
patent: 2002/0085184 (2002-07-01), Amano
patent: 2005/0062967 (2005-03-01), Kobayashi
patent: 2006/0279717 (2006-12-01), Hirano
patent: 62-183515 (1987-08-01), None

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