Exposure apparatus, device manufacturing method, stage...

Details Exposure apparatus, device manufacturing method, stage... Exposure apparatus, device manufacturing method, stage...

2006-04-11

2006-04-11

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S077000, C356S399000, C356S400000, C250S548000

Reexamination Certificate

active

07027127

ABSTRACT:
An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.

REFERENCES:
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patent: 5835560 (1998-11-01), Amemiya et al.
patent: 5978069 (1999-11-01), Kato
patent: 6381005 (2002-04-01), Kasumi et al.
patent: 6754303 (2004-06-01), Kasumi
patent: 2004/0004701 (2004-01-01), Kasumi
patent: 2829642 (1998-09-01), None

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