Exposure apparatus, device manufacturing method, pattern...

Details Exposure apparatus, device manufacturing method, pattern... Exposure apparatus, device manufacturing method, pattern...

2007-06-19

2007-06-19

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

Reexamination Certificate

active

11112695

ABSTRACT:
An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.

REFERENCES:
patent: 5330878 (1994-07-01), Nelson
patent: 5412186 (1995-05-01), Gale
patent: 5574276 (1996-11-01), Ishimaru
patent: 6379867 (2002-04-01), Mei et al.
patent: 6544698 (2003-04-01), Fries
patent: 6963434 (2005-11-01), Latypov
patent: 2005/0078284 (2005-04-01), Van De Ven et al.

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