Exposure apparatus, device manufacturing method,...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S030000

Reexamination Certificate

active

06864953

ABSTRACT:
An exposure apparatus for performing exposure of patterns of a reticle onto a substrate includes a first housing covering an optics space containing members of an optical system of an optical path of exposing light, a second housing covering a drive space containing driving members, which adjoins the optics space, members transparent to exposing light provided at boundaries of the adjacent first and second housings, a gas supplier which supplies the interior of the first and second housings with a purging gas, pressure sensors which sense pressures inside respective ones of the first and second housings, and a control unit which controls the gas supplier on the basis of outputs from the pressure sensors in such a manner that pressures within the respective first and second housings will attain respective ones of predetermined pressures.

REFERENCES:
patent: 5138643 (1992-08-01), Sakamoto et al.
patent: 5160961 (1992-11-01), Marumo et al.
patent: 5168512 (1992-12-01), Iwamoto et al.
patent: 5172403 (1992-12-01), Tanaka et al.
patent: 5822389 (1998-10-01), Uzawa et al.
patent: 6222610 (2001-04-01), Hagiwara
patent: 6545746 (2003-04-01), Nishi

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