Exposure apparatus and method which synchronously moves the mask

Details Exposure apparatus and method which synchronously moves the mask Exposure apparatus and method which synchronously moves the mask

1998-10-29

2000-04-18

Allen, Stephone B.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

355 55, 356399, G01N 2186

Patent

active

06051843&

ABSTRACT:
There is disclosed an exposure method for transferring, using an optical system for illuminating a mask having patterns to be transferred on a substrate and a projection optical system for projecting images of the patterns to the substrate, the patterns to the substrate through the projection optical system by means of scanning the mask and the substrate synchronously relative to the projection optical system. The method comprises the steps of providing a plurality of measuring marks on the mask formed along a relative scanning direction, and providing a plurality of reference marks formed on the stage corresponding to the measuring marks, respectively, moving the mask and the substrate synchronously in the relative scanning direction to measure successively a displacement amount between the measuring marks on the mask and the reference marks, and obtaining a correspondence relation between a coordinate system on the mask and a coordinate system on the stage according to the displacement amount.

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