Exposure apparatus and method of measuring Mueller Matrix of...

Details Exposure apparatus and method of measuring Mueller Matrix of... Exposure apparatus and method of measuring Mueller Matrix of...

2006-08-01

2006-08-01

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Reexamination Certificate

active

07084977

ABSTRACT:
A method is provided for measuring Mueller Matrix of an optical system of an exposure apparatus. Light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into a converted polarized light beam based on Mueller matrix of each optical system. With a linear polarizer or a linear phase retarder being properly inserted into an optical path of the converted polarized light beam, a light intensity is measured. Stokes parameters of the converted polarized light beam are calculated based on the measured light intensity.

REFERENCES:
patent: 5072126 (1991-12-01), Progler
patent: 6208415 (2001-03-01), De Boer et al.
patent: 6266141 (2001-07-01), Morita
patent: 6473179 (2002-10-01), Wang et al.
patent: 6844972 (2005-01-01), McGuire, Jr.

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