Exposure apparatus and method for producing device

Details Exposure apparatus and method for producing device Exposure apparatus and method for producing device

2007-02-23

2011-10-11

Young, Christopher (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

C430S311000, C430S330000, C430S945000, C355S027000, C355S030000, C355S053000, C355S072000, C355S077000

Reexamination Certificate

active

08034539

ABSTRACT:
An exposure system includes an exposure section for irradiating a formed resist film with exposing light through a mask with an immersion liquid provided on the resist film, and a drying section for drying a surface of the resist film after irradiation.

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