Exposure apparatus and method for producing device

Details Exposure apparatus and method for producing device Exposure apparatus and method for producing device

2007-06-07

2011-12-06

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

08072576

ABSTRACT:
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism40which removes the liquid remaining on a part7arranged in the vicinity of the image plane of the projection optical system.

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