Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2005-03-04

2009-11-03

McPherson, John A (Department: 1795)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C430S311000, C430S396000

Reexamination Certificate

active

07612864

ABSTRACT:
An exposure apparatus includes an optical system generating light, a mask, a light-absorbing member and a substrate plate. The mask includes a mask body disposed at a path of the light, a first light transmission pattern formed in a first region of the mask body, and a second light transmission pattern formed in a second region of the mask body. The mask is transported in a first direction. The light-absorbing member is disposed between the optical system and the mask, and has a diffusive reflection preventing part formed at a side surface of the light-absorbing member. The substrate plate supports a substrate having a photoresist layer formed thereon. The substrate plate is transported along the first direction together with the mask, thereby preventing a diffusive reflection.

REFERENCES:
patent: RE38176 (2003-07-01), Wakamoto et al.

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