Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-04-29
2009-10-20
McPherson, John A (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S313000, C430S394000, C430S005000
Reexamination Certificate
active
07604925
ABSTRACT:
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.
REFERENCES:
patent: 3941475 (1976-03-01), Sgeets
patent: 3947112 (1976-03-01), Hahn et al.
patent: 4373774 (1983-02-01), Dubroeucq et al.
patent: 4450358 (1984-05-01), Reynolds
patent: 4612270 (1986-09-01), Pampalone
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4666292 (1987-05-01), Imamura et al.
patent: 4744660 (1988-05-01), Noguchi et al.
patent: 4788600 (1988-11-01), Marsiglio et al.
patent: 4819033 (1989-04-01), Yoshitake et al.
patent: 4905041 (1990-02-01), Aketagawa
patent: 4947413 (1990-08-01), Jewell et al.
patent: 5016149 (1991-05-01), Tanaka
patent: 5048967 (1991-09-01), Suzuki et al.
patent: 5062705 (1991-11-01), Sato et al.
patent: 5121160 (1992-06-01), Sano et al.
patent: 5253110 (1993-10-01), Ichihara et al.
patent: 5305054 (1994-04-01), Suzuki et al.
patent: 5308741 (1994-05-01), Kemp
patent: 5315629 (1994-05-01), Jewell
patent: 5329333 (1994-07-01), Noguchi et al.
patent: 5340637 (1994-08-01), Okai
patent: 5479238 (1995-12-01), Whitney
patent: 5638220 (1997-06-01), Ohtomo et al.
patent: 5767949 (1998-06-01), Noguchi et al.
patent: 6485891 (2002-11-01), Noguchi et al.
patent: 7277155 (2007-10-01), Noguchi et al.
patent: 352975 (1990-01-01), None
patent: 8 123 725 (1983-06-01), None
patent: 57-191615 (1982-11-01), None
patent: 57-189144 (1982-12-01), None
patent: 59-049514 (1984-03-01), None
patent: 61-151 (1986-01-01), None
patent: 61-91662 (1986-05-01), None
patent: 61-108185 (1986-05-01), None
patent: 63-088453 (1988-04-01), None
patent: 63-320615 (1988-12-01), None
patent: 01-235289 (1989-09-01), None
patent: 01-257327 (1989-10-01), None
patent: 01-259533 (1989-10-01), None
patent: 02-142111 (1990-05-01), None
patent: 2-166717 (1990-06-01), None
patent: 3-015845 (1991-01-01), None
patent: 6-82598 (1994-10-01), None
patent: 9203842 (1990-08-01), None
Horiuchi, English translation of JP 61-91662, Projection Exposure Apparatus May 9, 1986.
“Effect of Central Obscuration on Image Formation In Projection Lithography”, Yang et al, SPIE vol. 1264 Optical/Laser Microlithography (1990), pp. 477-485.
Kenbo Yukio
Murayama Makoto
Noguchi Minori
Oshida Yoshitada
Shiba Masataka
Antonelli, Terry Stout & Kraus, LLP.
Chacko Davis Daborah
McPherson John A
Renesas Technology Corporation
LandOfFree
Exposure apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Exposure apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4085264