Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2007-02-13

2007-02-13

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000, C355S077000

Reexamination Certificate

active

11022033

ABSTRACT:
An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.

REFERENCES:
patent: 6952253 (2005-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Derksen et al.
patent: 2005/0134815 (2005-06-01), Van Santen et al.
patent: 2006/0017900 (2006-01-01), Novak
patent: 2006/0023182 (2006-02-01), Novak et al.
patent: 2006/0023183 (2006-02-01), Novak et al.
patent: WO 99/49504 (1999-09-01), None
Translation of WO 99/49504 cited by Applicant.
B. Smith et al.; “Extreme-NA Water Immersion Lithography for 35-65 nm Technology”; International Symposium on 157nm Lithography; Rochester Institute of Technology; Sep. 3-6, 2002; (8 pages).

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