Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

1996-03-15

1999-12-14

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Focus or magnification control

362268, G03B 2754, G02B 2700

Patent

active

060024674

ABSTRACT:
An exposure apparatus for transferring a pattern on a mask onto a photosensitized substrate by exposure, having an illumination optical system, a mask stage for moving the mask and a substrate stage for moving the substrate. An attenuator is disposed between the light source and the photosensitized substrate for attenuating the illumination beam with a variable attenuator rate. A controller controls the output power of the light source and attenuator of the illumination beam such that the exposure energy approaches a predetermined desired value. A stage controller controls the velocities at which the mask stage and the substrate stage are moved for scanning according to the difference between the exposure energy measured by the sensing system and the predetermined desired value.

REFERENCES:
patent: 5237367 (1993-08-01), Kudo
patent: 5253110 (1993-10-01), Ichibara et al.
patent: 5392094 (1995-02-01), Kudo
patent: 5594526 (1997-01-01), Mori et al.
patent: 5636003 (1997-06-01), Tanitsu et al.
patent: 5659429 (1997-08-01), Kudo

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