Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2005-08-23
2005-08-23
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S072000, C355S077000
Reexamination Certificate
active
06934006
ABSTRACT:
An exposure apparatus for exposing a photoresist film formed on a semiconductor substrate includes a plurality of reticle stages on which respective reticles can be supported at the same time. The reticles can be selectively and hence, successively, positioned along the optical axis of the apparatus that extends from the light source of the apparatus to a substrate stage. One region of the photoresist film is exposed to light directed through the first reticle. Then the second reticle stage is aligned and another region of the photoresist film is exposed to light directed through the second reticle.
REFERENCES:
patent: 5329335 (1994-07-01), Wada et al.
patent: 5526093 (1996-06-01), Takahashi
patent: 5706076 (1998-01-01), Takeda
patent: 5747221 (1998-05-01), Kim et al.
patent: 5781277 (1998-07-01), Iwamoto
patent: 5842824 (1998-12-01), Nishi
patent: 5933216 (1999-08-01), Dunn
patent: 6281965 (2001-08-01), Nakashima
patent: 6600550 (2003-07-01), Shigematsu
patent: 2003/0103196 (2003-06-01), Hirukawa
patent: 2003/0142284 (2003-07-01), Lin
patent: 2003/0193624 (2003-10-01), Kobayashi et al.
Lee Bong-Ki
Park Tae-Sin
Kim Peter B.
Samsung Electronics Co,. Ltd.
Volentine Francos & Whitt PLLC
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