X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1997-04-02
1999-07-27
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378206, H01L 2130
Patent
active
059303247
ABSTRACT:
An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.
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Chiba Yuji
Ebinuma Ryuichi
Matsui Shin
Tanaka Yutaka
Canon Kabushiki Kaisha
Porta David P.
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