Exposure apparatus and device fabrication method using the same

Details Exposure apparatus and device fabrication method using the same Exposure apparatus and device fabrication method using the same

2008-06-17

2009-12-01

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000

Reexamination Certificate

active

07626680

ABSTRACT:
An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.

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Partial European Search Report dated Nov. 20, 2008 issued by the European Patent Office in connection with application EP 04021381.1, which a foreign counterpart to the present application. (4 pages provided).
Japanese Office Action dated Feb. 24, 2009 concerning Japanese patent application JP2003-316726 which a foreign counterpart of the instant application (Japanese language provided; 3 pages).

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