Exposure apparatus and control of the same

Details Exposure apparatus and control of the same Exposure apparatus and control of the same

1989-09-06

1991-04-16

Gellner, Michael L.

Photocopying

Projection printing and copying cameras

Step and repeat

G03B 2742

Patent

active

050087037

ABSTRACT:
Exposure apparatus and control of the same, for exposing a semiconductor wafer to a mask with a predetermined radiation energy, for manufacture of semiconductor devices, is disclosed. During a time period in which the mask-to-wafer alignment or the exposure of the wafer to the mask is made, the operation of any other driving device that has no participation in the aligning operation or the exposure operation, is prohibited. This ensures high-precision pattern printing.

REFERENCES:
patent: 4595282 (1986-06-01), Takahashi
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4669867 (1987-06-01), Uda et al.
patent: 4749867 (1988-06-01), Matsushita et al.

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